Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si

K. Tomida, K. Kita, K. Kyuno, A. Toriumi

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)790-791
JournalExtended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
Publication statusPublished - 2004 Sep 1

Cite this

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title = "Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si",
author = "K. Tomida and K. Kita and K. Kyuno and A. Toriumi",
year = "2004",
month = "9",
day = "1",
language = "English",
pages = "790--791",
journal = "Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)",

}

TY - JOUR

T1 - Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si

AU - Tomida, K.

AU - Kita, K.

AU - Kyuno, K.

AU - Toriumi, A.

PY - 2004/9/1

Y1 - 2004/9/1

M3 - Article

SP - 790

EP - 791

JO - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

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