Femtosecond laser-assisted etching of fluoride crystals

Shigeki Matsuo, Kodai Iwasa, Takuro Tomita, Shuichi Hashimoto, Tatsuya Okada

Research output: Contribution to journalArticle

Abstract

Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

Original languageEnglish
Pages (from-to)245-248
Number of pages4
JournalJournal of Laser Micro Nanoengineering
Volume6
Issue number3
DOIs
Publication statusPublished - 2011 Dec

Keywords

  • CaF
  • Femtosecond laser-assisted etching
  • Fluoride
  • MgF
  • Micromachining

ASJC Scopus subject areas

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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