Femtosecond laser assisted etching of quartz

Microstructuring from inside

Shigeki Matsuo, Y. Tabuchi, T. Okada, S. Juodkazis, H. Misawa

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

In quartz crystal substrates, microchannels were made by femtosecond laser assisted etching, i.e., irradiation of focused femtosecond laser pulses followed by wet etching. By the use of wet etching, the laser irradiated region was selectively etched out, and a microchannel was formed inside the quartz substrate. The laser irradiated region was found to be amorphous by transmission electron microscopy. Anisotropy in the etching rate inside the quartz was observed.

Original languageEnglish
Pages (from-to)99-102
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume84
Issue number1-2
DOIs
Publication statusPublished - 2006 Jul
Externally publishedYes

Fingerprint

Quartz
Ultrashort pulses
Etching
quartz
Wet etching
etching
Microchannels
microchannels
lasers
Lasers
Substrates
Anisotropy
quartz crystals
Irradiation
Transmission electron microscopy
Crystals
transmission electron microscopy
anisotropy
irradiation
pulses

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Femtosecond laser assisted etching of quartz : Microstructuring from inside. / Matsuo, Shigeki; Tabuchi, Y.; Okada, T.; Juodkazis, S.; Misawa, H.

In: Applied Physics A: Materials Science and Processing, Vol. 84, No. 1-2, 07.2006, p. 99-102.

Research output: Contribution to journalArticle

Matsuo, Shigeki ; Tabuchi, Y. ; Okada, T. ; Juodkazis, S. ; Misawa, H. / Femtosecond laser assisted etching of quartz : Microstructuring from inside. In: Applied Physics A: Materials Science and Processing. 2006 ; Vol. 84, No. 1-2. pp. 99-102.
@article{d0b81522565e472e9efccbe7664dcfd3,
title = "Femtosecond laser assisted etching of quartz: Microstructuring from inside",
abstract = "In quartz crystal substrates, microchannels were made by femtosecond laser assisted etching, i.e., irradiation of focused femtosecond laser pulses followed by wet etching. By the use of wet etching, the laser irradiated region was selectively etched out, and a microchannel was formed inside the quartz substrate. The laser irradiated region was found to be amorphous by transmission electron microscopy. Anisotropy in the etching rate inside the quartz was observed.",
author = "Shigeki Matsuo and Y. Tabuchi and T. Okada and S. Juodkazis and H. Misawa",
year = "2006",
month = "7",
doi = "10.1007/s00339-006-3603-3",
language = "English",
volume = "84",
pages = "99--102",
journal = "Applied Physics",
issn = "0340-3793",
publisher = "Springer Heidelberg",
number = "1-2",

}

TY - JOUR

T1 - Femtosecond laser assisted etching of quartz

T2 - Microstructuring from inside

AU - Matsuo, Shigeki

AU - Tabuchi, Y.

AU - Okada, T.

AU - Juodkazis, S.

AU - Misawa, H.

PY - 2006/7

Y1 - 2006/7

N2 - In quartz crystal substrates, microchannels were made by femtosecond laser assisted etching, i.e., irradiation of focused femtosecond laser pulses followed by wet etching. By the use of wet etching, the laser irradiated region was selectively etched out, and a microchannel was formed inside the quartz substrate. The laser irradiated region was found to be amorphous by transmission electron microscopy. Anisotropy in the etching rate inside the quartz was observed.

AB - In quartz crystal substrates, microchannels were made by femtosecond laser assisted etching, i.e., irradiation of focused femtosecond laser pulses followed by wet etching. By the use of wet etching, the laser irradiated region was selectively etched out, and a microchannel was formed inside the quartz substrate. The laser irradiated region was found to be amorphous by transmission electron microscopy. Anisotropy in the etching rate inside the quartz was observed.

UR - http://www.scopus.com/inward/record.url?scp=33646790181&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33646790181&partnerID=8YFLogxK

U2 - 10.1007/s00339-006-3603-3

DO - 10.1007/s00339-006-3603-3

M3 - Article

VL - 84

SP - 99

EP - 102

JO - Applied Physics

JF - Applied Physics

SN - 0340-3793

IS - 1-2

ER -