Abstract
We report herein a method for the three-dimensional (3D) fabrication of microstructures by means of direct fs-beam writing (scanning) inside a polymerizable resin. Photopolymerization takes place via two-photon absorption (TPA), as indicated by measurements of transmission power dependence. This concept of fabrication is based on two principles: the use of short, sub-picosecond pulses and simultaneous tight focusing (numerical aperture, NA > 1). This approach creates a unique opportunity for avoiding self-focusing even at very high intensities, as the power is lower than the self-focusing threshold. Under such conditions, no filament formation takes place and no thermal convection disturbance occurs in the focal vicinity during photo-polymerization. This technique requires no sacrificial layers or structures in real 3D micro-stereo-lithography.
| Original language | English |
|---|---|
| Pages (from-to) | 561-566 |
| Number of pages | 6 |
| Journal | Applied Physics A: Materials Science and Processing |
| Volume | 73 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2001 Nov 1 |
| Externally published | Yes |
ASJC Scopus subject areas
- Chemistry(all)
- Materials Science(all)