Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

T.Homma T.Homma, R.Yamaguchi R.Yamaguchi, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journalArticle

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)3599-3603
JournalJournal of The Electochemical Society
Volume140
Publication statusPublished - 1993 Dec 1

Cite this

Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources. / T.Homma, T.Homma; R.Yamaguchi, R.Yamaguchi; Y.Murao, Y.Murao; Homma, Tetsuya.

In: Journal of The Electochemical Society, Vol. 140, 01.12.1993, p. 3599-3603.

Research output: Contribution to journalArticle

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