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Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro-Trialkoxy-Silane Group and Pure Water as Gas Sources
Tetsuya Homma
, Yukinobu Murao
Research output
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Contribution to journal
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Article
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peer-review
24
Citations (Scopus)
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Dive into the research topics of 'Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro-Trialkoxy-Silane Group and Pure Water as Gas Sources'. Together they form a unique fingerprint.
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Engineering & Materials Science
Silanes
100%
Chemical vapor deposition
90%
Oligomers
48%
Gases
44%
Water
42%
Polymerization
37%
Alcohols
36%
Byproducts
34%
Temperature
31%
Deposition rates
28%
Electric wiring
24%
Carbon
16%
Refractive index
14%
Vapor pressure
13%
Etching
12%
Methanol
11%
Ethanol
11%
Aluminum
8%
Chemical Compounds
Chemical Vapour Deposition
70%
Flow
50%
Ambient Reaction Temperature
43%
Gas
41%
Purity
39%
Liquid Film
37%
Velocity
37%
Byproduct
33%
Oligomer
26%
Carbon Number
26%
Alkyl Group
21%
Alcohol
20%
Polymerization Reaction
20%
Surface
17%
Deposition Technique
12%
Vapor Pressure
11%
Refractive Index
10%
Etching
10%
Dielectric Material
9%
Ethanol
7%
Methanol
6%