Original language | English |
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Pages (from-to) | 133 |
Journal | Materials Research Society, Spring Meeting Symp. F, Abstracts(F1.3) |
Publication status | Published - 1995 Apr 18 |
Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections
Research output: Contribution to journal › Article › peer-review