Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)133
JournalMaterials Research Society, Spring Meeting Symp. F, Abstracts(F1.3)
Publication statusPublished - 1995 Apr 18

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