| Original language | English |
|---|---|
| Pages (from-to) | 133 |
| Journal | Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3） |
| Publication status | Published - 1995 Apr 18 |
Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections
Research output: Contribution to journal › Article › peer-review