Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)133
JournalMaterials Research Society, Spring Meeting Symp. F, Abstracts(F1.3)
Publication statusPublished - 1995 Apr 18

Cite this

@article{794f859a2d4143beb53249e2daa322e9,
title = "Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections",
author = "T. Homma",
year = "1995",
month = "4",
day = "18",
language = "English",
pages = "133",
journal = "Materials Research Society, Spring Meeting Symp. F, Abstracts(F1.3)",

}

TY - JOUR

T1 - Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections

AU - Homma, T.

PY - 1995/4/18

Y1 - 1995/4/18

M3 - Article

SP - 133

JO - Materials Research Society, Spring Meeting Symp. F, Abstracts(F1.3)

JF - Materials Research Society, Spring Meeting Symp. F, Abstracts(F1.3)

ER -