| Original language | English |
|---|---|
| Pages (from-to) | 133 |
| Journal | Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3） |
| Publication status | Published - 1995 Apr 18 |
Cite this
Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections. / Homma, T.
In: Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3）, 18.04.1995, p. 133.Research output: Contribution to journal › Article
@article{794f859a2d4143beb53249e2daa322e9,
title = "Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections",
author = "T. Homma",
year = "1995",
month = "4",
day = "18",
language = "English",
pages = "133",
journal = "Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3）",
}
TY - JOUR
T1 - Fluorinated SiO2 Films for Interlayer Dielectrics in Quarter-micron Multilevel Interconnections
AU - Homma, T.
PY - 1995/4/18
Y1 - 1995/4/18
M3 - Article
SP - 133
JO - Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3）
JF - Materials Research Society, Spring Meeting Symp. F, Abstracts（F1.3）
ER -