Fluorinated SiO2 Films for Interlayer Dielectrics in Quartermicron Multilevel Interconnections

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)239-248
JournalLow-Dielectric Constant Materials - Synthesis and Applications in Microelectronics, Proceedings Volume
Volume381
Publication statusPublished - 1995 Jan 1

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