Formation and characterization of TiO                         2                          thin films with application to a multifunctional heat mirror

P. Jin; L. Miao; S. Tanemura; G. Xu; M. Tazawa; K. Yoshimura

doi:10.1016/S0169-4332(03)00045-X

Formation and characterization of TiO ₂ thin films with application to a multifunctional heat mirror

P. Jin, L. Miao, S. Tanemura, G. Xu, M. Tazawa, K. Yoshimura

Research output: Contribution to journal › Article › peer-review

48 Citations (Scopus)

Abstract

Thin films of titanium dioxide (TiO ₂ ) with desired crystal phase of anatase or rutile were formed by rf sputtering of a TiO ₂ target under precisely controlled process parameters. The application of TiO ₂ as the antireflection layers of a TiN-based heat mirror was testified. Optical calculation was done for the heat mirror, and an optimized structure with TiO ₂ (30nm)/TiN (30nm)/TiO ₂ (30nm) was deposited on SiO ₂ glass by sequential sputtering. Optical evaluation of the heat mirror was performed by measuring the transmittance/reflectance with a spectrophotometer in wavelengths 250-2500nm and with a FT-IR system in wavelengths 1-25μm, respectively. Furthermore, it is suggested that a better and a multifunctional performance can mostly be expected through precise control of the crystal structure of the TiO ₂ top layer which acts as a photocatalyst.

Original language	English
Pages (from-to)	775-781
Number of pages	7
Journal	Applied Surface Science
Volume	212-213
Issue number	SPEC.
DOIs	https://doi.org/10.1016/S0169-4332(03)00045-X
Publication status	Published - 2003 May 15
Externally published	Yes

Keywords

Anatase
Heat mirror
Photocatalyst
Rutile
Thin films
TiN
TiO

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/S0169-4332(03)00045-X

Cite this

Formation and characterization of TiO ₂ thin films with application to a multifunctional heat mirror . / Jin, P.; Miao, L.; Tanemura, S. et al.

In: Applied Surface Science, Vol. 212-213, No. SPEC., 15.05.2003, p. 775-781.

Research output: Contribution to journal › Article › peer-review

Jin, P, Miao, L, Tanemura, S, Xu, G, Tazawa, M & Yoshimura, K 2003, ' Formation and characterization of TiO ₂ thin films with application to a multifunctional heat mirror ', Applied Surface Science, vol. 212-213, no. SPEC., pp. 775-781. https://doi.org/10.1016/S0169-4332(03)00045-X

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abstract = " Thin films of titanium dioxide (TiO 2 ) with desired crystal phase of anatase or rutile were formed by rf sputtering of a TiO 2 target under precisely controlled process parameters. The application of TiO 2 as the antireflection layers of a TiN-based heat mirror was testified. Optical calculation was done for the heat mirror, and an optimized structure with TiO 2 (30nm)/TiN (30nm)/TiO 2 (30nm) was deposited on SiO 2 glass by sequential sputtering. Optical evaluation of the heat mirror was performed by measuring the transmittance/reflectance with a spectrophotometer in wavelengths 250-2500nm and with a FT-IR system in wavelengths 1-25μm, respectively. Furthermore, it is suggested that a better and a multifunctional performance can mostly be expected through precise control of the crystal structure of the TiO 2 top layer which acts as a photocatalyst.",

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