Formation and characterization of TiO 2 thin films with application to a multifunctional heat mirror

P. Jin, L. Miao, S. Tanemura, G. Xu, M. Tazawa, K. Yoshimura

Research output: Contribution to journalArticlepeer-review

43 Citations (Scopus)


Thin films of titanium dioxide (TiO 2 ) with desired crystal phase of anatase or rutile were formed by rf sputtering of a TiO 2 target under precisely controlled process parameters. The application of TiO 2 as the antireflection layers of a TiN-based heat mirror was testified. Optical calculation was done for the heat mirror, and an optimized structure with TiO 2 (30nm)/TiN (30nm)/TiO 2 (30nm) was deposited on SiO 2 glass by sequential sputtering. Optical evaluation of the heat mirror was performed by measuring the transmittance/reflectance with a spectrophotometer in wavelengths 250-2500nm and with a FT-IR system in wavelengths 1-25μm, respectively. Furthermore, it is suggested that a better and a multifunctional performance can mostly be expected through precise control of the crystal structure of the TiO 2 top layer which acts as a photocatalyst.

Original languageEnglish
Pages (from-to)775-781
Number of pages7
JournalApplied Surface Science
Issue numberSPEC.
Publication statusPublished - 2003 May 15
Externally publishedYes


  • Anatase
  • Heat mirror
  • Photocatalyst
  • Rutile
  • Thin films
  • TiN
  • TiO

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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