Formation and distribution of defect clusters near grain boundary of oxides implanted with Xe ions

M. Song, X. Guo, M. Takeguchi, K. Mitsuishi, M. Shimojo, K. Furuya

Research output: Contribution to journalArticle

Original languageEnglish
JournalDefault journal
Publication statusPublished - 2008 Aug 1

Cite this

Formation and distribution of defect clusters near grain boundary of oxides implanted with Xe ions. / Song, M.; Guo, X.; Takeguchi, M.; Mitsuishi, K.; Shimojo, M.; Furuya, K.

In: Default journal, 01.08.2008.

Research output: Contribution to journalArticle

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