Formation of iron nano-dots by electron beam induced deposition using an ultrahigh vacuum transmission electron microscope

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Furuya

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The fabrication of arrays of iron nano-dots on cleaned Si substrates by electron beam induced deposition (EBID) using ultrahigh vacuum (UHV) transmission electron microscope (TEM) was investigated. The samples were Si(111) slices prepared as TEM specimens by mechanical dimpling followed by chemical etching, with an etchant HNO3. After fabrication and observation of dots, the room temperature (RT)-deposited substrates were annealed at 700K for 1 hour and were observed again. Results show that the spots from the dots form hexagonal with lattice spacing of 0.203±nm and they are rotated about 17.5 degrees from <200> Si.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages60-61
Number of pages2
Publication statusPublished - 2004 Dec 1
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 2004 Oct 262004 Oct 29

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period04/10/2604/10/29

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Tanaka, M., Chu, F., Shimojo, M., Takeguchi, M., & Furuya, K. (2004). Formation of iron nano-dots by electron beam induced deposition using an ultrahigh vacuum transmission electron microscope. In Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 60-61). (Digest of Papers - Microprocesses and Nanotechnology 2004).