Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

M. Tanaka; F. Chu; M. Shimojo; M. Takeguchi; K. Mitsuishi; K. Furuya

doi:10.1007/s10853-006-7868-x

Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Mitsuishi, K. Furuya

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) ₅ was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi₂ islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.

Original language	English
Pages (from-to)	2667-2671
Number of pages	5
Journal	Journal of Materials Science
Volume	41
Issue number	9
DOIs	https://doi.org/10.1007/s10853-006-7868-x
Publication status	Published - 2006 May 1
Externally published	Yes

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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@article{da4a6b8c03604b7f9047d7b520f40c58,

title = "Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams",

abstract = "Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.",

author = "M. Tanaka and F. Chu and M. Shimojo and M. Takeguchi and K. Mitsuishi and K. Furuya",

year = "2006",

month = may,

day = "1",

doi = "10.1007/s10853-006-7868-x",

language = "English",

volume = "41",

pages = "2667--2671",

journal = "Journal of Materials Science",

issn = "0022-2461",

publisher = "Springer Netherlands",

number = "9",

}

TY - JOUR

T1 - Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

AU - Tanaka, M.

AU - Chu, F.

AU - Shimojo, M.

AU - Takeguchi, M.

AU - Mitsuishi, K.

AU - Furuya, K.

PY - 2006/5/1

Y1 - 2006/5/1

N2 - Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.

AB - Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.

UR - http://www.scopus.com/inward/record.url?scp=33744734390&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33744734390&partnerID=8YFLogxK

U2 - 10.1007/s10853-006-7868-x

DO - 10.1007/s10853-006-7868-x

M3 - Article

AN - SCOPUS:33744734390

VL - 41

SP - 2667

EP - 2671

JO - Journal of Materials Science

JF - Journal of Materials Science

SN - 0022-2461

IS - 9

ER -

Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

Abstract

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