Abstract
Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
| Original language | English |
|---|---|
| Pages (from-to) | 2667-2671 |
| Number of pages | 5 |
| Journal | Journal of Materials Science |
| Volume | 41 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2006 May 1 |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
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Cite this
Tanaka, M., Chu, F., Shimojo, M., Takeguchi, M., Mitsuishi, K., & Furuya, K. (2006). Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams. Journal of Materials Science, 41(9), 2667-2671. https://doi.org/10.1007/s10853-006-7868-x