Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Mitsuishi, K. Furuya

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Abstract

Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.

Original languageEnglish
Pages (from-to)2667-2671
Number of pages5
JournalJournal of Materials Science
Volume41
Issue number9
DOIs
Publication statusPublished - 2006 May 1

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ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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