Abstract
Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
| Original language | English |
|---|---|
| Pages (from-to) | 2667-2671 |
| Number of pages | 5 |
| Journal | Journal of Materials Science |
| Volume | 41 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2006 May |
| Externally published | Yes |
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ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
Cite this
Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams. / Tanaka, M.; Chu, F.; Shimojo, Masayuki; Takeguchi, M.; Mitsuishi, K.; Furuya, K.
In: Journal of Materials Science, Vol. 41, No. 9, 05.2006, p. 2667-2671.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams
AU - Tanaka, M.
AU - Chu, F.
AU - Shimojo, Masayuki
AU - Takeguchi, M.
AU - Mitsuishi, K.
AU - Furuya, K.
PY - 2006/5
Y1 - 2006/5
N2 - Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
AB - Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
UR - http://www.scopus.com/inward/record.url?scp=33744734390&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33744734390&partnerID=8YFLogxK
U2 - 10.1007/s10853-006-7868-x
DO - 10.1007/s10853-006-7868-x
M3 - Article
AN - SCOPUS:33744734390
VL - 41
SP - 2667
EP - 2671
JO - Journal of Materials Science
JF - Journal of Materials Science
SN - 0022-2461
IS - 9
ER -