Generalized Model of Oxidation Mechanism at HfO2/Si Interface with Post-Deposition Annealing

H. Shimizu, Kentaro Kyuno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)796-797
JournalExtended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
Publication statusPublished - 2004 Sep 1

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