Original language | English |
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Journal | Applied Physics Letters |
Volume | 85 |
Publication status | Published - 2004 Apr 1 |
Growth Mechanism Difference of Sputtered HfO2 on Ge and on Si
K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno
Research output: Contribution to journal › Article › peer-review
91
Citations
(Scopus)