Growth Mechanism Difference of Sputtered HfO2 on Ge and on Si

K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journalArticle

82 Citations (Scopus)
Original languageEnglish
JournalApplied Physics Letters
Volume85
Publication statusPublished - 2004 Apr 1

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