H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

K.Kishimoto K.Kishimoto, K.Imaoka K.Imaoka, K.Koyanagi K.Koyanagi, T.Homma T.Homma, Tetsuya Homma

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)168-170
JournalExtended Abstract of International Conference on Solid State Devices and Materials (SSDM)
Publication statusPublished - 1995 Aug 21

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