H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

K.Kishimoto K.Kishimoto, K.Imaoka K.Imaoka, K.Koyanagi K.Koyanagi, T.Homma T.Homma, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	168-170
Journal	Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)
Publication status	Published - 1995 Aug 21

Cite this

Research output: Contribution to journal › Article › peer-review

@article{b8b06e3981914a8f9827a3739bb8066b,

title = "H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment",

author = "K.Kishimoto K.Kishimoto and K.Imaoka K.Imaoka and K.Koyanagi K.Koyanagi and T.Homma T.Homma and Tetsuya Homma",

year = "1995",

month = aug,

day = "21",

language = "English",

pages = "168--170",

journal = "Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)",

}

TY - JOUR

T1 - H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

AU - K.Kishimoto, K.Kishimoto

AU - K.Imaoka, K.Imaoka

AU - K.Koyanagi, K.Koyanagi

AU - T.Homma, T.Homma

AU - Homma, Tetsuya

PY - 1995/8/21

Y1 - 1995/8/21

M3 - Article

SP - 168

EP - 170

JO - Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)

ER -