High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current

Tomoki Akimoto; Kazuyoshi Ueno

doi:10.1109/EDTM.2019.8731128

High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current

Tomoki Akimoto, Kazuyoshi Ueno

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

To achieve a low temperature deposition of high crystalline multilayer graphene (MLG), the effect of applying current to the catalyst layer was investigated in MLG-CVD using Ni catalyst. When the substrate temperature was varied at a fixed current, the MLG crystallinity was improved as the temperature became lower, and the G/D ratio of 40 was obtained at 464 °C. By optimizing the precursor flow-rate and deposition time, complete surface coverage was obtained at 490 °C.

Original language	English
Title of host publication	2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	351-353
Number of pages	3
ISBN (Electronic)	9781538665084
DOIs	https://doi.org/10.1109/EDTM.2019.8731128
Publication status	Published - 2019 Mar
Event	2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 - Singapore, Singapore Duration: 2019 Mar 12 → 2019 Mar 15

Publication series

Name	2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Conference

Conference	2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019
Country	Singapore
City	Singapore
Period	19/3/12 → 19/3/15

Keywords

CVD
current
multilayer graphene

ASJC Scopus subject areas

Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials
Instrumentation
Hardware and Architecture

Access to Document

10.1109/EDTM.2019.8731128

Fingerprint Dive into the research topics of 'High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current'. Together they form a unique fingerprint.

Cite this

Akimoto, T., & Ueno, K. (2019). High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current. In 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 (pp. 351-353). [8731128] (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/EDTM.2019.8731128

High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current. / Akimoto, Tomoki; Ueno, Kazuyoshi.

2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., 2019. p. 351-353 8731128 (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Akimoto, T & Ueno, K 2019, High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current. in 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019., 8731128, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019, Institute of Electrical and Electronics Engineers Inc., pp. 351-353, 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019, Singapore, Singapore, 19/3/12. https://doi.org/10.1109/EDTM.2019.8731128

Akimoto T, Ueno K. High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current. In 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc. 2019. p. 351-353. 8731128. (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019). https://doi.org/10.1109/EDTM.2019.8731128

Akimoto, Tomoki ; Ueno, Kazuyoshi. / High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current. 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019. Institute of Electrical and Electronics Engineers Inc., 2019. pp. 351-353 (2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019).

@inproceedings{be162807399b4caf89aa63acf6b77384,

title = "High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current",

abstract = "To achieve a low temperature deposition of high crystalline multilayer graphene (MLG), the effect of applying current to the catalyst layer was investigated in MLG-CVD using Ni catalyst. When the substrate temperature was varied at a fixed current, the MLG crystallinity was improved as the temperature became lower, and the G/D ratio of 40 was obtained at 464 °C. By optimizing the precursor flow-rate and deposition time, complete surface coverage was obtained at 490 °C.",

keywords = "CVD, current, multilayer graphene",

author = "Tomoki Akimoto and Kazuyoshi Ueno",

year = "2019",

month = mar,

doi = "10.1109/EDTM.2019.8731128",

language = "English",

series = "2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "351--353",

booktitle = "2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019",

note = "2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019 ; Conference date: 12-03-2019 Through 15-03-2019",

}

TY - GEN

T1 - High crystallinity multilayer graphene deposited by a low-temperature CVD using Ni catalyst with applying current

AU - Akimoto, Tomoki

AU - Ueno, Kazuyoshi

PY - 2019/3

Y1 - 2019/3

N2 - To achieve a low temperature deposition of high crystalline multilayer graphene (MLG), the effect of applying current to the catalyst layer was investigated in MLG-CVD using Ni catalyst. When the substrate temperature was varied at a fixed current, the MLG crystallinity was improved as the temperature became lower, and the G/D ratio of 40 was obtained at 464 °C. By optimizing the precursor flow-rate and deposition time, complete surface coverage was obtained at 490 °C.

AB - To achieve a low temperature deposition of high crystalline multilayer graphene (MLG), the effect of applying current to the catalyst layer was investigated in MLG-CVD using Ni catalyst. When the substrate temperature was varied at a fixed current, the MLG crystallinity was improved as the temperature became lower, and the G/D ratio of 40 was obtained at 464 °C. By optimizing the precursor flow-rate and deposition time, complete surface coverage was obtained at 490 °C.

KW - CVD

KW - current

KW - multilayer graphene

UR - http://www.scopus.com/inward/record.url?scp=85067805776&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85067805776&partnerID=8YFLogxK

U2 - 10.1109/EDTM.2019.8731128

DO - 10.1109/EDTM.2019.8731128

M3 - Conference contribution

AN - SCOPUS:85067805776

T3 - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

SP - 351

EP - 353

BT - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Y2 - 12 March 2019 through 15 March 2019

ER -