High-speed rotating-disk chemical vapor deposition process for in-situ arsenic-doped polycrystalline silicon films

Fujio Terai, Hiroaki Kobayashi, Shuji Katsui, Naoki Tamaoki, Takao Nagatomo, Tetsuya Homma

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy