Abstract
High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.
| Original language | English |
|---|---|
| Pages (from-to) | 301-306 |
| Number of pages | 6 |
| Journal | Kagaku Kogaku Ronbunshu |
| Volume | 39 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2013 |
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Keywords
- Counter Diffusion CVD
- High Temperature Propylene/Propane Separation
- Silica Hybrid Membranes
ASJC Scopus subject areas
- Chemical Engineering(all)
- Chemistry(all)
Cite this
High temperature propylene permselective membrane prepared by counter diffusion CVD. / Matsuyama, Emi; Utsumi, Keisuke; Ikeda, Ayumi; Nomura, Mikihiro.
In: Kagaku Kogaku Ronbunshu, Vol. 39, No. 4, 2013, p. 301-306.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - High temperature propylene permselective membrane prepared by counter diffusion CVD
AU - Matsuyama, Emi
AU - Utsumi, Keisuke
AU - Ikeda, Ayumi
AU - Nomura, Mikihiro
PY - 2013
Y1 - 2013
N2 - High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.
AB - High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.
KW - Counter Diffusion CVD
KW - High Temperature Propylene/Propane Separation
KW - Silica Hybrid Membranes
UR - http://www.scopus.com/inward/record.url?scp=84880687697&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84880687697&partnerID=8YFLogxK
U2 - 10.1252/kakoronbunshu.39.301
DO - 10.1252/kakoronbunshu.39.301
M3 - Article
AN - SCOPUS:84880687697
VL - 39
SP - 301
EP - 306
JO - Kagaku Kogaku Ronbunshu
JF - Kagaku Kogaku Ronbunshu
SN - 0386-216X
IS - 4
ER -