High temperature propylene permselective membrane prepared by counter diffusion CVD

Emi Matsuyama; Keisuke Utsumi; Ayumi Ikeda; Mikihiro Nomura

doi:10.1252/kakoronbunshu.39.301

High temperature propylene permselective membrane prepared by counter diffusion CVD

Emi Matsuyama, Keisuke Utsumi, Ayumi Ikeda, Mikihiro Nomura

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

High C³H⁶ permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C₃H₆/C₃H₈ permeance ratio was 414 (C₃H₆ permeance 1.0 ×10^-8 mol m^-2 s^-1 Pa^-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O₂ system to obtain a high C₃H₆ permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N₂/SF₆ permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N₂/SF₆ permeance ratio showed the maximum at 2.2 × 10⁵ through the membrane deposited at 450°C for 5 min.

Original language	English
Pages (from-to)	301-306
Number of pages	6
Journal	KAGAKU KOGAKU RONBUNSHU
Volume	39
Issue number	4
DOIs	https://doi.org/10.1252/kakoronbunshu.39.301
Publication status	Published - 2013 Jul 31

Keywords

Counter Diffusion CVD
High Temperature Propylene/Propane Separation
Silica Hybrid Membranes

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)

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title = "High temperature propylene permselective membrane prepared by counter diffusion CVD",

abstract = "High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.",

keywords = "Counter Diffusion CVD, High Temperature Propylene/Propane Separation, Silica Hybrid Membranes",

author = "Emi Matsuyama and Keisuke Utsumi and Ayumi Ikeda and Mikihiro Nomura",

year = "2013",

month = jul,

day = "31",

doi = "10.1252/kakoronbunshu.39.301",

language = "English",

volume = "39",

pages = "301--306",

journal = "Kagaku Kogaku Ronbunshu",

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T1 - High temperature propylene permselective membrane prepared by counter diffusion CVD

AU - Matsuyama, Emi

AU - Utsumi, Keisuke

AU - Ikeda, Ayumi

AU - Nomura, Mikihiro

PY - 2013/7/31

Y1 - 2013/7/31

N2 - High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.

AB - High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.

KW - Counter Diffusion CVD

KW - High Temperature Propylene/Propane Separation

KW - Silica Hybrid Membranes

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