Abstract
High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.
Original language | English |
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Pages (from-to) | 301-306 |
Number of pages | 6 |
Journal | KAGAKU KOGAKU RONBUNSHU |
Volume | 39 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2013 Jul 31 |
Keywords
- Counter Diffusion CVD
- High Temperature Propylene/Propane Separation
- Silica Hybrid Membranes
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)