High-temperature propylene/propane separation through silica hybrid membranes

E. Matsuyama, A. Ikeda, M. Komatsuzaki, M. Sasaki, Mikihiro Nomura

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

C3H6-permselective silica hybrid membranes were prepared by using a counter-diffusion chemical vapor deposition (CVD) method. Propyltrimethoxysilane and hexyltrimethoxysilane (HTMOS) were used as silica precursors and O3 and O2 were used as oxidants. HTMOS was a suitable silica precursor for high-temperature CVD because of its high thermal stability. The N2/SF6 permeance ratio decreased from 64 to 12 as the deposition time increased from 5 to 90 min. The maximum N 2/SF6 permeance ratio was 2.2 × 105 through the membrane deposited at 450 °C for 5 min. The C3H 6/C3H8 permeance ratio was 414 (C 3H6 permeance 1.0 × 10-8 mol m -2 s-1 Pa-1) through this membrane.

Original languageEnglish
Pages (from-to)25-30
Number of pages6
JournalSeparation and Purification Technology
Volume128
DOIs
Publication statusPublished - 2014 May 13

Fingerprint

Propane
Silicon Dioxide
Propylene
Silica
Membranes
Chemical vapor deposition
Oxidants
Temperature
Thermodynamic stability
propylene

Keywords

  • Chemical vapor deposition
  • Propylene/propane separation
  • Silica hybrid membrane

ASJC Scopus subject areas

  • Analytical Chemistry
  • Filtration and Separation

Cite this

High-temperature propylene/propane separation through silica hybrid membranes. / Matsuyama, E.; Ikeda, A.; Komatsuzaki, M.; Sasaki, M.; Nomura, Mikihiro.

In: Separation and Purification Technology, Vol. 128, 13.05.2014, p. 25-30.

Research output: Contribution to journalArticle

Matsuyama, E. ; Ikeda, A. ; Komatsuzaki, M. ; Sasaki, M. ; Nomura, Mikihiro. / High-temperature propylene/propane separation through silica hybrid membranes. In: Separation and Purification Technology. 2014 ; Vol. 128. pp. 25-30.
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