High-temperature propylene/propane separation through silica hybrid membranes

E. Matsuyama, A. Ikeda, M. Komatsuzaki, M. Sasaki, M. Nomura

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

C3H6-permselective silica hybrid membranes were prepared by using a counter-diffusion chemical vapor deposition (CVD) method. Propyltrimethoxysilane and hexyltrimethoxysilane (HTMOS) were used as silica precursors and O3 and O2 were used as oxidants. HTMOS was a suitable silica precursor for high-temperature CVD because of its high thermal stability. The N2/SF6 permeance ratio decreased from 64 to 12 as the deposition time increased from 5 to 90 min. The maximum N 2/SF6 permeance ratio was 2.2 × 105 through the membrane deposited at 450 °C for 5 min. The C3H 6/C3H8 permeance ratio was 414 (C 3H6 permeance 1.0 × 10-8 mol m -2 s-1 Pa-1) through this membrane.

Original languageEnglish
Pages (from-to)25-30
Number of pages6
JournalSeparation and Purification Technology
Volume128
DOIs
Publication statusPublished - 2014 May 13

Keywords

  • Chemical vapor deposition
  • Propylene/propane separation
  • Silica hybrid membrane

ASJC Scopus subject areas

  • Analytical Chemistry
  • Filtration and Separation

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