HIGH-TRANSCONDUCTANCE P-CHANNEL MODULATION-DOPED AlGaAs/GaAs HETEROSTRUCTURE FET'S.

Makoto Hirano, Kunishige Oe, Fumihiko Yanagawa

Research output: Contribution to journalArticle

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Abstract

The authors report the fabrication of p-channel modulation-doped AlGaAs-GaAs heterostructure FETs (p-HFETs) using two-dimensional hole gas (2DHG) under various geometrical device parameter conditions. The p-HFET characteristics were measured at 300 and 77 K for the following three device-parameter ranges: the gate length L//g (1-320 mu m), the gate-source distance L//g //s (0. 5-5 mu m), and the layer thickness d//t (35-58 nm) of AlGaAs beneath the gate. Based on the obtained results, a high-performance enhancement-mode p-HFET was fabricated with the following parameters: L//g equals 1 mu m, L//g //s equals 0. 5 mu m, and d//t equals 35 nm. The achieved extrinsic transconductance g//m was 75 mS/mm at 77 K. This experimental result indicates that a g//m greater than 200 mS/mm at 77 K can be obtained in 1- mu m gate p-HFET devices.

Original languageEnglish
Pages (from-to)620-624
Number of pages5
JournalIEEE Transactions on Electron Devices
VolumeED-33
Issue number5
Publication statusPublished - 1986 Mar
Externally publishedYes

Fingerprint

Transconductance
transconductance
aluminum gallium arsenides
Heterojunctions
Gases
Modulation
modulation
Fabrication
fabrication
gallium arsenide
augmentation
gases

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)

Cite this

HIGH-TRANSCONDUCTANCE P-CHANNEL MODULATION-DOPED AlGaAs/GaAs HETEROSTRUCTURE FET'S. / Hirano, Makoto; Oe, Kunishige; Yanagawa, Fumihiko.

In: IEEE Transactions on Electron Devices, Vol. ED-33, No. 5, 03.1986, p. 620-624.

Research output: Contribution to journalArticle

Hirano, Makoto ; Oe, Kunishige ; Yanagawa, Fumihiko. / HIGH-TRANSCONDUCTANCE P-CHANNEL MODULATION-DOPED AlGaAs/GaAs HETEROSTRUCTURE FET'S. In: IEEE Transactions on Electron Devices. 1986 ; Vol. ED-33, No. 5. pp. 620-624.
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