Highly Selective Photoresist Ashing by Addition of Ammonia to Plasma Containing Carbon Tetrafluoride

Makoto Saito, Hideo Eto, Kayoko Omiya, Tetsuya Homma, Takao Nagatomo

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Highly Selective Photoresist Ashing by Addition of Ammonia to Plasma Containing Carbon Tetrafluoride'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds