Improvement of polymer type EB resist sensitivity and line edge roughness

Makoto Otani, Hironori Asada, Hosei Tsunoda, Masashi Kunitake, Takahiro Ishizaki, Ryuji Miyagawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

In order to improve sensitivity and line edge roughness (LER) for electron beam (EB) lithography, the positive-type polymer resists with various molecular weights and controlled dispersion were newly synthesized and examined. The synthesized resists have the same composition as ZEP520A (Nippon Zeon). With the low molecular and the narrow dispersion resist, improvements of both the sensitivity and LER are confirmed by obtaining the SEM images of line and space resist patterns exposed by EB writing system at an acceleration voltage of 100 kV. The polymer resist with molecular weight (Mw: 30k) and dispersion (1.4) exhibited 22 nm hp resolution, 20% improved LER and 15 % improved sensitivity compared with original ZEP520A.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume8081
DOIs
Publication statusPublished - 2011
Externally publishedYes
EventPhotomask and Next-Generation Lithography Mask Technology XVIII - Yokohama
Duration: 2011 Apr 132011 Apr 15

Other

OtherPhotomask and Next-Generation Lithography Mask Technology XVIII
CityYokohama
Period11/4/1311/4/15

Fingerprint

Electron beams
Polymers
roughness
Surface roughness
electron beams
sensitivity
molecular weight
polymers
Molecular weight
Electron beam lithography
lithography
Scanning electron microscopy
scanning electron microscopy
Electric potential
electric potential
Chemical analysis

Keywords

  • Dispersion
  • Electron beam lithography
  • Line edge roughness (LER)
  • Molecular weight
  • Polymer resist
  • Positive type resist
  • Resolution
  • Sensitivity

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Otani, M., Asada, H., Tsunoda, H., Kunitake, M., Ishizaki, T., & Miyagawa, R. (2011). Improvement of polymer type EB resist sensitivity and line edge roughness. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 8081). [808107] https://doi.org/10.1117/12.897792

Improvement of polymer type EB resist sensitivity and line edge roughness. / Otani, Makoto; Asada, Hironori; Tsunoda, Hosei; Kunitake, Masashi; Ishizaki, Takahiro; Miyagawa, Ryuji.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8081 2011. 808107.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Otani, M, Asada, H, Tsunoda, H, Kunitake, M, Ishizaki, T & Miyagawa, R 2011, Improvement of polymer type EB resist sensitivity and line edge roughness. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 8081, 808107, Photomask and Next-Generation Lithography Mask Technology XVIII, Yokohama, 11/4/13. https://doi.org/10.1117/12.897792
Otani M, Asada H, Tsunoda H, Kunitake M, Ishizaki T, Miyagawa R. Improvement of polymer type EB resist sensitivity and line edge roughness. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8081. 2011. 808107 https://doi.org/10.1117/12.897792
Otani, Makoto ; Asada, Hironori ; Tsunoda, Hosei ; Kunitake, Masashi ; Ishizaki, Takahiro ; Miyagawa, Ryuji. / Improvement of polymer type EB resist sensitivity and line edge roughness. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8081 2011.
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