In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials

Kazuo Furuya, Minghui Song, Masayuki Shimojo

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)

Abstract

Ion implantation causes the formation of nano-phases as well as radiation damage. “In-situ” observation in a TEM is a unique technique to clarify such phenomena. One example is Xe nanocrystals embedded in a metal matrix. HRTEM observations revealed the atomic structures and the motion of atoms in a Xe nanocrystal. Electron beam-induced deposition is another technique to fabricate nano-structures. Nanostructures having desired shape and size can be obtained. Metal atoms are deposited using focused electron beam irradiation under the presence of a small amount of precursor gas molecules on the substrate. The details of these ion and electron beam effects are reviewed.

Original languageEnglish
Title of host publicationIn-Situ Electron Microscopy at High Resolution
PublisherWorld Scientific Publishing Co.
Pages229-258
Number of pages30
ISBN (Electronic)9789812797346
ISBN (Print)9812797335, 9789812797339
DOIs
Publication statusPublished - 2008 Jan 1

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

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    Furuya, K., Song, M., & Shimojo, M. (2008). In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials. In In-Situ Electron Microscopy at High Resolution (pp. 229-258). World Scientific Publishing Co.. https://doi.org/10.1007/9789812797346_0007