Original language | English |
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Journal | 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI) |
Publication status | Published - 2011 May 25 |
Influence of oxygene transfer in Hf-based high-k dielectrics on flatband voltage shift
T.Nabatame T.Nabatame, M.Kimura M.Kimura, H.Yamada A.Ohi, T.Ohishi T.Ohishi, T.Chikyow T.Chikyow, Tomoji Oishi
Research output: Contribution to journal › Article › peer-review