Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces

T. Wadayama, K. Takeuchi, K. Mukai, T. Tanabe, A. Hatta

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Adsorption and decomposition of dimethylaluminum-hydride (DMAH) on various Si(111) and Si(100) surfaces was investigated at 90 K using multiple reflection infrared (IR) attenuated total reflection (ATR) method. The infrared absorption on the chemically oxidized Si(111) surface due to DMAH increased linearly with DMAH exposure which indicate that DMAH was condensed on the surface. The results show that DMAH exposure to the hydrogen terminated Si(100) surface leads to a slight intensity decrease in the bands due to surface hydrides.

Original languageEnglish
Pages (from-to)299-304
Number of pages6
JournalJournal of Vacuum Science and Technology A
Volume20
Issue number2
DOIs
Publication statusPublished - 2002 Mar
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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