Intelligent design architecture for process control of deep-drawing

K. Manabe, H. Koyama, K. Katoh, Shouichirou Yoshihara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

A concept of design architecture with a database for an intelligent sheet metal forming system was proposed to enable designing of a process control system without experts who are skilled and experienced in the forming process. In this study, the proposed architecture was applied to the variable blank holding force (BHF) control technique for circular-cup deep-drawing. The system is available for three objective functions which are typical process requirements, cup wall uniformity, cup height improvement and energy saving. The availability of this design architecture is confirmed by experiments on aluminum alloy sheets.

Original languageEnglish
Title of host publicationProceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999
EditorsMarcello M. Veiga, John A. Meech, Michael H. Smith, Steven R. LeClair
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages571-576
Number of pages6
Volume1
ISBN (Electronic)0780354893, 9780780354890
DOIs
Publication statusPublished - 1999 Jan 1
Externally publishedYes
Event2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999 - Honolulu, United States
Duration: 1999 Jul 101999 Jul 15

Other

Other2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999
CountryUnited States
CityHonolulu
Period99/7/1099/7/15

Fingerprint

Deep drawing
Process control
Metal forming
Force control
Sheet metal
Aluminum alloys
Energy conservation
Availability
Control systems
Experiments

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Materials Science (miscellaneous)

Cite this

Manabe, K., Koyama, H., Katoh, K., & Yoshihara, S. (1999). Intelligent design architecture for process control of deep-drawing. In M. M. Veiga, J. A. Meech, M. H. Smith, & S. R. LeClair (Eds.), Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999 (Vol. 1, pp. 571-576). [792541] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IPMM.1999.792541

Intelligent design architecture for process control of deep-drawing. / Manabe, K.; Koyama, H.; Katoh, K.; Yoshihara, Shouichirou.

Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. ed. / Marcello M. Veiga; John A. Meech; Michael H. Smith; Steven R. LeClair. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 1999. p. 571-576 792541.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Manabe, K, Koyama, H, Katoh, K & Yoshihara, S 1999, Intelligent design architecture for process control of deep-drawing. in MM Veiga, JA Meech, MH Smith & SR LeClair (eds), Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. vol. 1, 792541, Institute of Electrical and Electronics Engineers Inc., pp. 571-576, 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999, Honolulu, United States, 99/7/10. https://doi.org/10.1109/IPMM.1999.792541
Manabe K, Koyama H, Katoh K, Yoshihara S. Intelligent design architecture for process control of deep-drawing. In Veiga MM, Meech JA, Smith MH, LeClair SR, editors, Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. Vol. 1. Institute of Electrical and Electronics Engineers Inc. 1999. p. 571-576. 792541 https://doi.org/10.1109/IPMM.1999.792541
Manabe, K. ; Koyama, H. ; Katoh, K. ; Yoshihara, Shouichirou. / Intelligent design architecture for process control of deep-drawing. Proceedings of the 2nd International Conference on Intelligent Processing and Manufacturing of Materials, IPMM 1999. editor / Marcello M. Veiga ; John A. Meech ; Michael H. Smith ; Steven R. LeClair. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 1999. pp. 571-576
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