| Original language | English |
|---|---|
| Pages (from-to) | 575-584 |
| Journal | Simulation of Materials Processing. Theory, Methods and Applications- |
| Volume | (1995) |
| Publication status | Published - 1995 Jul 1 |
Cite this
Ihara, I., Aizawa, T., Kihara, J., & Koguchi, H. (1995). Inverse analysis with surface wave spectroscopy to determine material properties of thin film on substrate. Simulation of Materials Processing. Theory, Methods and Applications-, (1995), 575-584.
Inverse analysis with surface wave spectroscopy to determine material properties of thin film on substrate. / Ihara, I.; Aizawa, T.; Kihara, J.; Koguchi, H.
In: Simulation of Materials Processing. Theory, Methods and Applications-, Vol. (1995), 01.07.1995, p. 575-584.Research output: Contribution to journal › Article
Ihara, I, Aizawa, T, Kihara, J & Koguchi, H 1995, 'Inverse analysis with surface wave spectroscopy to determine material properties of thin film on substrate.', Simulation of Materials Processing. Theory, Methods and Applications-, vol. (1995), pp. 575-584.
Ihara I, Aizawa T, Kihara J, Koguchi H. Inverse analysis with surface wave spectroscopy to determine material properties of thin film on substrate. Simulation of Materials Processing. Theory, Methods and Applications-. 1995 Jul 1;(1995):575-584.
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