IR Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200cm-1 to 2000cm-1

K. Tomida, H. Shimizu, K. Kita, K. Kyuno, A. Toriumi

Research output: Contribution to journalArticle

Original languageEnglish
Journal2004 MRS Spring Meeting
Publication statusPublished - 2004 Apr 1

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