IR Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200cm-1 to 2000cm-1

K. Tomida, H. Shimizu, K. Kita, K. Kyuno, A. Toriumi

Research output: Contribution to journalArticle

Original languageEnglish
Journal2004 MRS Spring Meeting
Publication statusPublished - 2004 Apr 1

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IR Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200cm-1 to 2000cm-1. / Tomida, K.; Shimizu, H.; Kita, K.; Kyuno, K.; Toriumi, A.

In: 2004 MRS Spring Meeting, 01.04.2004.

Research output: Contribution to journalArticle

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title = "IR Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200cm-1 to 2000cm-1",
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AU - Tomida, K.

AU - Shimizu, H.

AU - Kita, K.

AU - Kyuno, K.

AU - Toriumi, A.

PY - 2004/4/1

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