Key mechanism for improved EM lifetime of CoWP capped Cu interconnects

Y. Kakuhara, Y. Kakuhara;N. Kawahara;K.Ueno, N.Oda N.Oda, Kazuyoshi Ueno

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)144-145
JournalEntended Abstracts of the 2006 Int. Conf, on Solid State Dev. and Mat.
Publication statusPublished - 2006 Sep 13

Cite this

Key mechanism for improved EM lifetime of CoWP capped Cu interconnects. / Kakuhara, Y.; Kawahara;K.Ueno, Y. Kakuhara;N.; N.Oda, N.Oda; Ueno, Kazuyoshi.

In: Entended Abstracts of the 2006 Int. Conf, on Solid State Dev. and Mat., 13.09.2006, p. 144-145.

Research output: Contribution to journalArticle

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AU - Ueno, Kazuyoshi

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