Kinetic Model of Si Oxidation at HfO2/Si Interface with Post Deposition Annealing

H.Shimizu H.Shimizu, K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journalArticle

27 Citations (Scopus)
Original languageEnglish
JournalJapanese Journal of Applied Physics
Volume44
Publication statusPublished - 2005 Apr 1

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