Kinetic model of Si oxidation at HfO2/Si interface with post deposition annealing

Haruka Shimizu, Koji Kita, Kentaro Kyuno, Akira Toriumi

Research output: Contribution to journalArticlepeer-review

29 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Kinetic model of Si oxidation at HfO<sub>2</sub>/Si interface with post deposition annealing'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy