Laser-scanning direction effect in femtosecond laser-assisted etching

Shigeki Matsuo, Yoshifumi Umeda, Takuro Tomita, Shuichi Hashimoto

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In this study we examined how the laser-scanning direction during the inscription of modified lines affects to the etching rate along the lines in the femtosecond laser-assisted etching. An isotropic material (silica) was used as the sample. Circular polarization was used for inscribing modified lines, in order to avoid a direction effect arising from polarization. Scanning direction dependence was observed in the etching rate along the modified lines. The relation between the occurrence of a scanning direction effect and the other inscribing pa-rameters (pitch and pulse energy) was examined.

Original languageEnglish
Pages (from-to)35-38
Number of pages4
JournalJournal of Laser Micro Nanoengineering
Volume8
Issue number1
DOIs
Publication statusPublished - 2013 Jan
Externally publishedYes

Fingerprint

Ultrashort pulses
Etching
etching
Scanning
scanning
Lasers
lasers
Circular polarization
circular polarization
Silica
Polarization
occurrences
silicon dioxide
polarization
pulses
energy

Keywords

  • Etching rate
  • Femtosecond laser-assisted etching
  • KOH
  • Pulse front tilt.
  • Quill effect
  • Scanning direction effect
  • Silica glass

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Instrumentation
  • Electrical and Electronic Engineering

Cite this

Laser-scanning direction effect in femtosecond laser-assisted etching. / Matsuo, Shigeki; Umeda, Yoshifumi; Tomita, Takuro; Hashimoto, Shuichi.

In: Journal of Laser Micro Nanoengineering, Vol. 8, No. 1, 01.2013, p. 35-38.

Research output: Contribution to journalArticle

Matsuo, Shigeki ; Umeda, Yoshifumi ; Tomita, Takuro ; Hashimoto, Shuichi. / Laser-scanning direction effect in femtosecond laser-assisted etching. In: Journal of Laser Micro Nanoengineering. 2013 ; Vol. 8, No. 1. pp. 35-38.
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