Liquid phase formation of alkyl- and perfluoro-phosphonic acid derived monolayers on magnesium alloy AZ31 and their chemical properties

Takahiro Ishizaki, Katsuya Teshima, Yoshitake Masuda, Michiru Sakamoto

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Alkyl- and perfluoro-phosphonic acid derived SAMs were successfully formed on Mg alloy by liquid phase method for the first time. The chemical and anticorrosive properties of the prepared SAMs on magnesium alloys were characterized using contact angle measurements, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and electrochemical measurements. Water contact angle measurements revealed that the maximum advancing/receding water contact angles of n-octyl (OP: CH3(CH2)7PO(OH)2), n-dodecyl (DP: CH3(CH2)11PO(OH)2), n-octadecyl (ODP: CH3(CH2)17PO(OH)2) phosphonic acid, and 2-(perfluorohexyl)ethyl (PFEP: CF3(CF2)5CH2CH2PO(OH)2) phosphonic acid were 105.1/64.7°, 108.3/69.6°, 111.9/75.2°, and 115.2/67.4° respectively. In the case of alkylphosphonic acid SAMs (OP, DP, and ODP), the advancing and receding water contact angles increased with an increase in the preparation time. The angle-resolved XPS (AR-XPS) data revealed that the film thicknesses of the OP, DP, ODP, PFEP on Mg alloy were estimated to be 0.8, 1.2, 1.7, and 1.1nm, respectively. The XPS O 1s data support that the phosphonic acid derived SAM is covalently bound to the oxide or hydroxide surface of the Mg alloy in a monodenate or bidenate manner. Chemical stability of the alkyl- and perfluoro-phosphonic acid modified Mg alloy surfaces was investigated using aqueous solutions at pH=4.0, 7.0, and 10.0. The contact angles of OP, DP, and PFEP modified Mg surface decreased rapidly within the first 5min after immersion in all the aqueous solutions and were less than 20°. On the other hand, the contact angles of the ODP modified Mg alloy after immersion in aqueous solutions at pH 4, 7 and 10 for 5min were 45.1°, 89.3,° and 85.5°, respectively. The ODP modified Mg alloy had highest chemical stability in four types of the phosphonic acid derived SAMs used in this study, indicating that the molecular density of ODP on Mg alloy would be higher than those of OP, DP, PFEP on Mg alloy. The corrosion resistance of ODP modified Mg alloy was investigated by potentiodynamic polarization curve measurements. The ODP modified Mg alloy exhibits protective properties in a solution containing Cl- ions compared to unmodified Mg alloy.

Original languageEnglish
Pages (from-to)280-288
Number of pages9
JournalJournal of Colloid and Interface Science
Volume360
Issue number1
DOIs
Publication statusPublished - 2011 Aug 1
Externally publishedYes

Fingerprint

Magnesium alloys
Chemical properties
Monolayers
Acids
Liquids
Contact angle
X ray photoelectron spectroscopy
Chemical stability
Angle measurement
Water
phosphonic acid
Mg-Al-Zn-Mn-Si-Cu alloy
Potentiodynamic polarization
Oxides
Film thickness
Corrosion resistance
Atomic force microscopy
Ions

Keywords

  • Corrosion resistance
  • Mg alloy
  • Self-assembled monolayer
  • Wetting property

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Colloid and Surface Chemistry

Cite this

Liquid phase formation of alkyl- and perfluoro-phosphonic acid derived monolayers on magnesium alloy AZ31 and their chemical properties. / Ishizaki, Takahiro; Teshima, Katsuya; Masuda, Yoshitake; Sakamoto, Michiru.

In: Journal of Colloid and Interface Science, Vol. 360, No. 1, 01.08.2011, p. 280-288.

Research output: Contribution to journalArticle

@article{fda5e98068734b6689c10f6dd1b319bc,
title = "Liquid phase formation of alkyl- and perfluoro-phosphonic acid derived monolayers on magnesium alloy AZ31 and their chemical properties",
abstract = "Alkyl- and perfluoro-phosphonic acid derived SAMs were successfully formed on Mg alloy by liquid phase method for the first time. The chemical and anticorrosive properties of the prepared SAMs on magnesium alloys were characterized using contact angle measurements, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and electrochemical measurements. Water contact angle measurements revealed that the maximum advancing/receding water contact angles of n-octyl (OP: CH3(CH2)7PO(OH)2), n-dodecyl (DP: CH3(CH2)11PO(OH)2), n-octadecyl (ODP: CH3(CH2)17PO(OH)2) phosphonic acid, and 2-(perfluorohexyl)ethyl (PFEP: CF3(CF2)5CH2CH2PO(OH)2) phosphonic acid were 105.1/64.7°, 108.3/69.6°, 111.9/75.2°, and 115.2/67.4° respectively. In the case of alkylphosphonic acid SAMs (OP, DP, and ODP), the advancing and receding water contact angles increased with an increase in the preparation time. The angle-resolved XPS (AR-XPS) data revealed that the film thicknesses of the OP, DP, ODP, PFEP on Mg alloy were estimated to be 0.8, 1.2, 1.7, and 1.1nm, respectively. The XPS O 1s data support that the phosphonic acid derived SAM is covalently bound to the oxide or hydroxide surface of the Mg alloy in a monodenate or bidenate manner. Chemical stability of the alkyl- and perfluoro-phosphonic acid modified Mg alloy surfaces was investigated using aqueous solutions at pH=4.0, 7.0, and 10.0. The contact angles of OP, DP, and PFEP modified Mg surface decreased rapidly within the first 5min after immersion in all the aqueous solutions and were less than 20°. On the other hand, the contact angles of the ODP modified Mg alloy after immersion in aqueous solutions at pH 4, 7 and 10 for 5min were 45.1°, 89.3,° and 85.5°, respectively. The ODP modified Mg alloy had highest chemical stability in four types of the phosphonic acid derived SAMs used in this study, indicating that the molecular density of ODP on Mg alloy would be higher than those of OP, DP, PFEP on Mg alloy. The corrosion resistance of ODP modified Mg alloy was investigated by potentiodynamic polarization curve measurements. The ODP modified Mg alloy exhibits protective properties in a solution containing Cl- ions compared to unmodified Mg alloy.",
keywords = "Corrosion resistance, Mg alloy, Self-assembled monolayer, Wetting property",
author = "Takahiro Ishizaki and Katsuya Teshima and Yoshitake Masuda and Michiru Sakamoto",
year = "2011",
month = "8",
day = "1",
doi = "10.1016/j.jcis.2011.04.039",
language = "English",
volume = "360",
pages = "280--288",
journal = "Journal of Colloid and Interface Science",
issn = "0021-9797",
publisher = "Academic Press Inc.",
number = "1",

}

TY - JOUR

T1 - Liquid phase formation of alkyl- and perfluoro-phosphonic acid derived monolayers on magnesium alloy AZ31 and their chemical properties

AU - Ishizaki, Takahiro

AU - Teshima, Katsuya

AU - Masuda, Yoshitake

AU - Sakamoto, Michiru

PY - 2011/8/1

Y1 - 2011/8/1

N2 - Alkyl- and perfluoro-phosphonic acid derived SAMs were successfully formed on Mg alloy by liquid phase method for the first time. The chemical and anticorrosive properties of the prepared SAMs on magnesium alloys were characterized using contact angle measurements, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and electrochemical measurements. Water contact angle measurements revealed that the maximum advancing/receding water contact angles of n-octyl (OP: CH3(CH2)7PO(OH)2), n-dodecyl (DP: CH3(CH2)11PO(OH)2), n-octadecyl (ODP: CH3(CH2)17PO(OH)2) phosphonic acid, and 2-(perfluorohexyl)ethyl (PFEP: CF3(CF2)5CH2CH2PO(OH)2) phosphonic acid were 105.1/64.7°, 108.3/69.6°, 111.9/75.2°, and 115.2/67.4° respectively. In the case of alkylphosphonic acid SAMs (OP, DP, and ODP), the advancing and receding water contact angles increased with an increase in the preparation time. The angle-resolved XPS (AR-XPS) data revealed that the film thicknesses of the OP, DP, ODP, PFEP on Mg alloy were estimated to be 0.8, 1.2, 1.7, and 1.1nm, respectively. The XPS O 1s data support that the phosphonic acid derived SAM is covalently bound to the oxide or hydroxide surface of the Mg alloy in a monodenate or bidenate manner. Chemical stability of the alkyl- and perfluoro-phosphonic acid modified Mg alloy surfaces was investigated using aqueous solutions at pH=4.0, 7.0, and 10.0. The contact angles of OP, DP, and PFEP modified Mg surface decreased rapidly within the first 5min after immersion in all the aqueous solutions and were less than 20°. On the other hand, the contact angles of the ODP modified Mg alloy after immersion in aqueous solutions at pH 4, 7 and 10 for 5min were 45.1°, 89.3,° and 85.5°, respectively. The ODP modified Mg alloy had highest chemical stability in four types of the phosphonic acid derived SAMs used in this study, indicating that the molecular density of ODP on Mg alloy would be higher than those of OP, DP, PFEP on Mg alloy. The corrosion resistance of ODP modified Mg alloy was investigated by potentiodynamic polarization curve measurements. The ODP modified Mg alloy exhibits protective properties in a solution containing Cl- ions compared to unmodified Mg alloy.

AB - Alkyl- and perfluoro-phosphonic acid derived SAMs were successfully formed on Mg alloy by liquid phase method for the first time. The chemical and anticorrosive properties of the prepared SAMs on magnesium alloys were characterized using contact angle measurements, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and electrochemical measurements. Water contact angle measurements revealed that the maximum advancing/receding water contact angles of n-octyl (OP: CH3(CH2)7PO(OH)2), n-dodecyl (DP: CH3(CH2)11PO(OH)2), n-octadecyl (ODP: CH3(CH2)17PO(OH)2) phosphonic acid, and 2-(perfluorohexyl)ethyl (PFEP: CF3(CF2)5CH2CH2PO(OH)2) phosphonic acid were 105.1/64.7°, 108.3/69.6°, 111.9/75.2°, and 115.2/67.4° respectively. In the case of alkylphosphonic acid SAMs (OP, DP, and ODP), the advancing and receding water contact angles increased with an increase in the preparation time. The angle-resolved XPS (AR-XPS) data revealed that the film thicknesses of the OP, DP, ODP, PFEP on Mg alloy were estimated to be 0.8, 1.2, 1.7, and 1.1nm, respectively. The XPS O 1s data support that the phosphonic acid derived SAM is covalently bound to the oxide or hydroxide surface of the Mg alloy in a monodenate or bidenate manner. Chemical stability of the alkyl- and perfluoro-phosphonic acid modified Mg alloy surfaces was investigated using aqueous solutions at pH=4.0, 7.0, and 10.0. The contact angles of OP, DP, and PFEP modified Mg surface decreased rapidly within the first 5min after immersion in all the aqueous solutions and were less than 20°. On the other hand, the contact angles of the ODP modified Mg alloy after immersion in aqueous solutions at pH 4, 7 and 10 for 5min were 45.1°, 89.3,° and 85.5°, respectively. The ODP modified Mg alloy had highest chemical stability in four types of the phosphonic acid derived SAMs used in this study, indicating that the molecular density of ODP on Mg alloy would be higher than those of OP, DP, PFEP on Mg alloy. The corrosion resistance of ODP modified Mg alloy was investigated by potentiodynamic polarization curve measurements. The ODP modified Mg alloy exhibits protective properties in a solution containing Cl- ions compared to unmodified Mg alloy.

KW - Corrosion resistance

KW - Mg alloy

KW - Self-assembled monolayer

KW - Wetting property

UR - http://www.scopus.com/inward/record.url?scp=79957839986&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79957839986&partnerID=8YFLogxK

U2 - 10.1016/j.jcis.2011.04.039

DO - 10.1016/j.jcis.2011.04.039

M3 - Article

C2 - 21565354

AN - SCOPUS:79957839986

VL - 360

SP - 280

EP - 288

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

SN - 0021-9797

IS - 1

ER -