Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures

H. Nishikawa, Y. Furuta, N. Uchiya, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We demonstrated fabrication of high-aspect ratio structures by proton beam writing on positive and negative resists. High aspect ratio up to 20 and smallest feature size up to 130 nm were achieved. The depth of machining is controlled so accurately by the beam injection energy. We succeeded in the production of three dimension micro-structures, 'Arch of Triumph', by double drawing on the same resist-sample by two kinds of microbeams with different energies and with different patterns. This shows a unique feature of the PBW as a micromachining tool for multilevel microstructures.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages66-67
Number of pages2
DOIs
Publication statusPublished - 2007 Dec 1
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
Duration: 2007 Nov 52007 Nov 8

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Conference

Conferences20th International Microprocesses and Nanotechnology Conference, MNC 2007
CountryJapan
CityKyoto
Period07/11/507/11/8

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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