Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai Kozakai, Yoshiyuki Naito

Research output: Contribution to journalArticle

Abstract

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

Original languageEnglish
Pages (from-to)635-639
Number of pages5
JournalJapanese Journal of Applied Physics
Volume33
Issue number11R
DOIs
Publication statusPublished - 1994
Externally publishedYes

Fingerprint

Etching
etching
Masks
masks
Waveguides
waveguides
propagation
Garnets
Chemical shift
Ion bombardment
garnets
Light absorption
chemical equilibrium
bombardment
surface layers
slabs
optical absorption
X ray photoelectron spectroscopy
photoelectron spectroscopy
causes

Keywords

  • (LuNdBi)(FeAl) O
  • Optical absorption loss
  • Reactive ion etching
  • Rib waveguide
  • Sputter etching
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching. / Yokoi, Hideki; Mizumoto, Tetsuya; Ida, Takehiro; Kozakai, Kazuki Kozakai; Naito, Yoshiyuki.

In: Japanese Journal of Applied Physics, Vol. 33, No. 11R, 1994, p. 635-639.

Research output: Contribution to journalArticle

Yokoi, Hideki ; Mizumoto, Tetsuya ; Ida, Takehiro ; Kozakai, Kazuki Kozakai ; Naito, Yoshiyuki. / Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching. In: Japanese Journal of Applied Physics. 1994 ; Vol. 33, No. 11R. pp. 635-639.
@article{b7237fbf009e4b158a2660676f1cf26f,
title = "Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching",
abstract = "Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.",
keywords = "(LuNdBi)(FeAl) O, Optical absorption loss, Reactive ion etching, Rib waveguide, Sputter etching, X-ray photoelectron spectroscopy",
author = "Hideki Yokoi and Tetsuya Mizumoto and Takehiro Ida and Kozakai, {Kazuki Kozakai} and Yoshiyuki Naito",
year = "1994",
doi = "10.1143/JJAP.33.6355",
language = "English",
volume = "33",
pages = "635--639",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11R",

}

TY - JOUR

T1 - Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

AU - Yokoi, Hideki

AU - Mizumoto, Tetsuya

AU - Ida, Takehiro

AU - Kozakai, Kazuki Kozakai

AU - Naito, Yoshiyuki

PY - 1994

Y1 - 1994

N2 - Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

AB - Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

KW - (LuNdBi)(FeAl) O

KW - Optical absorption loss

KW - Reactive ion etching

KW - Rib waveguide

KW - Sputter etching

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=84957340490&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84957340490&partnerID=8YFLogxK

U2 - 10.1143/JJAP.33.6355

DO - 10.1143/JJAP.33.6355

M3 - Article

VL - 33

SP - 635

EP - 639

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11R

ER -