Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai Kozakai, Yoshiyuki Naito

Research output: Contribution to journalArticle

Abstract

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

Original languageEnglish
Pages (from-to)635-639
Number of pages5
JournalJapanese Journal of Applied Physics
Volume33
Issue number11R
DOIs
Publication statusPublished - 1994
Externally publishedYes

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Keywords

  • (LuNdBi)(FeAl) O
  • Optical absorption loss
  • Reactive ion etching
  • Rib waveguide
  • Sputter etching
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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