Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai Kozakai, Yoshiyuki Naito

Research output: Contribution to journalArticlepeer-review

Abstract

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

Original languageEnglish
Pages (from-to)635-639
Number of pages5
JournalJapanese Journal of Applied Physics
Volume33
Issue number11R
DOIs
Publication statusPublished - 1994 Nov
Externally publishedYes

Keywords

  • (LuNdBi)(FeAl) O
  • Optical absorption loss
  • Reactive ion etching
  • Rib waveguide
  • Sputter etching
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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