Low resistance copper via technology (Invited)

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Y.Tsuchiya Y.Tsuchiya, H.Aoki H.Aoki, Kazuyoshi Ueno

Research output: Contribution to journal › Article

Original language	English
Journal	Abstract of Symposium on Advanced Interconnects and Contacts
Publication status	Published - 1999 Apr 5

Cite this

@article{9710b94fca254ffcbd1b319cc20dd186,

title = "Low resistance copper via technology (Invited)",

author = "K.Ueno K.Ueno and V.M.Donnelly V.M.Donnelly and Y.Tsuchiya Y.Tsuchiya and H.Aoki H.Aoki and Kazuyoshi Ueno",

year = "1999",

month = apr,

day = "5",

language = "English",

journal = "Abstract of Symposium on Advanced Interconnects and Contacts",

}