| Original language | English |
|---|---|
| Journal | Abstract of Symposium on Advanced Interconnects and Contacts |
| Publication status | Published - 1999 Apr 5 |
Cite this
K.Ueno, K. U., V.M.Donnelly, V. M. D., Y.Tsuchiya, Y. T., H.Aoki, H. A., & Ueno, K. (1999). Low resistance copper via technology (Invited). Abstract of Symposium on Advanced Interconnects and Contacts.
Low resistance copper via technology (Invited). / K.Ueno, K.Ueno; V.M.Donnelly, V.M.Donnelly; Y.Tsuchiya, Y.Tsuchiya; H.Aoki, H.Aoki; Ueno, Kazuyoshi.
In: Abstract of Symposium on Advanced Interconnects and Contacts, 05.04.1999.Research output: Contribution to journal › Article
K.Ueno, KU, V.M.Donnelly, VMD, Y.Tsuchiya, YT, H.Aoki, HA & Ueno, K 1999, 'Low resistance copper via technology (Invited)', Abstract of Symposium on Advanced Interconnects and Contacts.
K.Ueno KU, V.M.Donnelly VMD, Y.Tsuchiya YT, H.Aoki HA, Ueno K. Low resistance copper via technology (Invited). Abstract of Symposium on Advanced Interconnects and Contacts. 1999 Apr 5.
@article{9710b94fca254ffcbd1b319cc20dd186,
title = "Low resistance copper via technology (Invited)",
author = "K.Ueno K.Ueno and V.M.Donnelly V.M.Donnelly and Y.Tsuchiya Y.Tsuchiya and H.Aoki H.Aoki and Kazuyoshi Ueno",
year = "1999",
month = "4",
day = "5",
language = "English",
journal = "Abstract of Symposium on Advanced Interconnects and Contacts",
}
TY - JOUR
T1 - Low resistance copper via technology (Invited)
AU - K.Ueno, K.Ueno
AU - V.M.Donnelly, V.M.Donnelly
AU - Y.Tsuchiya, Y.Tsuchiya
AU - H.Aoki, H.Aoki
AU - Ueno, Kazuyoshi
PY - 1999/4/5
Y1 - 1999/4/5
M3 - Article
JO - Abstract of Symposium on Advanced Interconnects and Contacts
JF - Abstract of Symposium on Advanced Interconnects and Contacts
ER -