Original language | English |
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Journal | Abstract of Symposium on Advanced Interconnects and Contacts |
Publication status | Published - 1999 Apr 5 |
Low resistance copper via technology (Invited)
K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Y.Tsuchiya Y.Tsuchiya, H.Aoki H.Aoki, Kazuyoshi Ueno
Research output: Contribution to journal › Article › peer-review