Low resistance copper via technology (Invited)

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, Y.Tsuchiya Y.Tsuchiya, H.Aoki H.Aoki, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
JournalAbstract of Symposium on Advanced Interconnects and Contacts
Publication statusPublished - 1999 Apr 5

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