Low-resistance metal contacts for nanocarbon/cobalt interconnects

Kazuyoshi Ueno, Masashi Takagi, Hiroaki Yano, Taichi Wakui, Yuichi Yamazaki, Naoshi Sakuma, Akihiro Kajita, Tadashi Sakai

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Low-resistance metal contacts for CVD-nanocarbon (NC)/cobalt (Co) interconnects have been investigated among contact metals such as Ni, Ti, Au, and Cu. Contact resistivity was independent of contact area owing to low-resistance NC/Co interconnect structure. The lowest contact resistivity and superior adhesion were obtained from Ni. Although the factors for the low contact resistivity were not clear enough from the comparison of work-function difference and adhesion strength for the contact metals, Ni is a promising low-resistivity contact metal for CVD-NC interconnects in the future.

Original languageEnglish
Article number05FD01
JournalJapanese Journal of Applied Physics
Volume52
Issue number5 PART 4
DOIs
Publication statusPublished - 2013 May

Fingerprint

low resistance
electric contacts
Cobalt
cobalt
electrical resistivity
Metals
metals
Chemical vapor deposition
adhesion
vapor deposition
Bond strength (materials)
Adhesion

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Ueno, K., Takagi, M., Yano, H., Wakui, T., Yamazaki, Y., Sakuma, N., ... Sakai, T. (2013). Low-resistance metal contacts for nanocarbon/cobalt interconnects. Japanese Journal of Applied Physics, 52(5 PART 4), [05FD01]. https://doi.org/10.7567/JJAP.52.05FD01

Low-resistance metal contacts for nanocarbon/cobalt interconnects. / Ueno, Kazuyoshi; Takagi, Masashi; Yano, Hiroaki; Wakui, Taichi; Yamazaki, Yuichi; Sakuma, Naoshi; Kajita, Akihiro; Sakai, Tadashi.

In: Japanese Journal of Applied Physics, Vol. 52, No. 5 PART 4, 05FD01, 05.2013.

Research output: Contribution to journalArticle

Ueno, K, Takagi, M, Yano, H, Wakui, T, Yamazaki, Y, Sakuma, N, Kajita, A & Sakai, T 2013, 'Low-resistance metal contacts for nanocarbon/cobalt interconnects', Japanese Journal of Applied Physics, vol. 52, no. 5 PART 4, 05FD01. https://doi.org/10.7567/JJAP.52.05FD01
Ueno, Kazuyoshi ; Takagi, Masashi ; Yano, Hiroaki ; Wakui, Taichi ; Yamazaki, Yuichi ; Sakuma, Naoshi ; Kajita, Akihiro ; Sakai, Tadashi. / Low-resistance metal contacts for nanocarbon/cobalt interconnects. In: Japanese Journal of Applied Physics. 2013 ; Vol. 52, No. 5 PART 4.
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