Low-resistance metal contacts for nanocarbon/cobalt interconnects

Kazuyoshi Ueno, Masashi Takagi, Hiroaki Yano, Taichi Wakui, Yuichi Yamazaki, Naoshi Sakuma, Akihiro Kajita, Tadashi Sakai

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Low-resistance metal contacts for CVD-nanocarbon (NC)/cobalt (Co) interconnects have been investigated among contact metals such as Ni, Ti, Au, and Cu. Contact resistivity was independent of contact area owing to low-resistance NC/Co interconnect structure. The lowest contact resistivity and superior adhesion were obtained from Ni. Although the factors for the low contact resistivity were not clear enough from the comparison of work-function difference and adhesion strength for the contact metals, Ni is a promising low-resistivity contact metal for CVD-NC interconnects in the future.

Original languageEnglish
Article number05FD01
JournalJapanese Journal of Applied Physics
Volume52
Issue number5 PART 4
DOIs
Publication statusPublished - 2013 May 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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