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Low temperature interlayer formation technology using a new siloxane polymer film
M. Suzuki,
T. Homma
, Y. Numasawa
Research output
:
Contribution to conference
›
Paper
›
peer-review
3
Citations (Scopus)
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Engineering & Materials Science
Polymer films
100%
Silanes
32%
Temperature
30%
Annealing
24%
Furnaces
22%
Heat treatment
21%
Organic polymers
19%
Dielectric films
18%
Oligomers
18%
Polymer solutions
16%
Thick films
15%
Phosphorus
15%
Chemical vapor deposition
14%
Electric wiring
13%
Ethanol
12%
Carbon
9%
Cracks
8%