Maskless lateral epitaxial over growth of GaN films on in situ etched sapphire substrates by metalorganic chemical vapor deposition

Maosheng Hao, Takashi Egawa, Hiroyasu Ishikawa

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

It has been reported recently that the sapphire substrate can be etched inside a metalorganic chemical vapor deposition reactor through GaN decomposition-induced reaction, and that device-quality GaN films can be grown on thus etched substrates with residual gallium droplets acting as nucleation sites [Hao et al., Appl. Phys. Lett 84 (2004) 4041]. In the present study, a maskless lateral epitaxial over growth (LEO) method is proposed to produce GaN films with reduced dislocation density through the use of in situ etched sapphire substrates. The microstructure of such GaN films was investigated by transmission electron microscopy and scanning electron microscopy, and the effect of lateral over growth has been confirmed. Dislocations in such GaN films were further analyzed through etch-pits density experiment and it has been found that this maskless LEO method is very effective to reduce pure edge dislocation density in the GaN films.

Original languageEnglish
Pages (from-to)466-472
Number of pages7
JournalJournal of Crystal Growth
Volume285
Issue number4
DOIs
Publication statusPublished - 2005 Dec 15

Keywords

  • A3. Maskless lateral epitaxial over growth (LEO)
  • A3. Metalorganic chemical vapor deposition
  • B1. GaN

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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