Mechanical and field emission properties of CGed Si(C,N) films synthesized by PECVD from HMDS precursor

Y. S. Li, Hajime Kiyono, S. Shimada, X. Lu, A. Hirose

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Compositionally graded (CGed) Si(C,N) films were prepared by Ar/H2/N2 plasma enhanced chemical vapor deposition from liquid injected hexamethyldisiloxane precursor. The films were characterized by scanning/transmission electron microscopy (SEM/TEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Monolithic crystalline SiC and amorphous SiNx films were produced from Ar/H2 and Ar/H2/N2 thermal plasma, respectively. The CGed SiC-SiNx film was obtained by changing N2 flow rate from 2 L/min to zero in Ar/H2/N2 during the deposition process, and it was composed of an uppermost crystalline SiC layer, a thin intermediate layer containing nanocomposite c-SiC/a-SiNx and an innermost layer of amorphous SiNx. The CGed SiNx-SiC film, in which SiNx acts as a top layer with a SiC layer underneath, was fabricated by an inverse change of the plasma gas supply from initial Ar/H2 to Ar/H2/N2. Microhardness increase and promising field emission properties were obtained from these CGed films in comparison with monolithic SiC and SiNx films.

Original languageEnglish
Pages (from-to)1727-1731
Number of pages5
JournalDiamond and Related Materials
Volume15
Issue number10
DOIs
Publication statusPublished - 2006 Oct
Externally publishedYes

Fingerprint

Plasma enhanced chemical vapor deposition
Field emission
field emission
Plasma Gases
Crystalline materials
Transmission electron microscopy
Plasmas
Scanning electron microscopy
Gas supply
Amorphous films
transmission electron microscopy
scanning electron microscopy
thermal plasmas
Microhardness
Nanocomposites
microhardness
X ray photoelectron spectroscopy
Flow rate
nanocomposites
x rays

Keywords

  • Field emission
  • Liquid alkoxide precursor
  • Plasma CVD
  • SiCN film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Mechanical and field emission properties of CGed Si(C,N) films synthesized by PECVD from HMDS precursor. / Li, Y. S.; Kiyono, Hajime; Shimada, S.; Lu, X.; Hirose, A.

In: Diamond and Related Materials, Vol. 15, No. 10, 10.2006, p. 1727-1731.

Research output: Contribution to journalArticle

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AU - Hirose, A.

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