Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata, Tatsuhiko Aizawa

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

Original languageEnglish
Pages (from-to)16-20
Number of pages5
JournalManufacturing Letters
Volume8
DOIs
Publication statusPublished - 2016 Apr 1

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Keywords

  • CVD diamond coating
  • High etching rate
  • Hollow-cathode oxygen plasma
  • Micro-grooving
  • Plasma etching

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Mechanics of Materials

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