Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata, Tatsuhiko Aizawa

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

Original languageEnglish
Pages (from-to)16-20
Number of pages5
JournalManufacturing Letters
Volume8
DOIs
Publication statusPublished - 2016 Apr 1

Fingerprint

Plasma etching
Diamond films
Chemical vapor deposition
Diamonds
Cathodes
Reactive ion etching
Oxygen
Coatings
Texturing
Surface measurement
Ions
Linewidth
Carrier concentration
Raman spectroscopy
Masks
Stainless steel
Plasmas
Atoms
Carbon
Electrons

Keywords

  • CVD diamond coating
  • High etching rate
  • Hollow-cathode oxygen plasma
  • Micro-grooving
  • Plasma etching

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Mechanics of Materials

Cite this

Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching. / Yunata, Ersyzario Edo; Aizawa, Tatsuhiko.

In: Manufacturing Letters, Vol. 8, 01.04.2016, p. 16-20.

Research output: Contribution to journalArticle

Yunata, Ersyzario Edo ; Aizawa, Tatsuhiko. / Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching. In: Manufacturing Letters. 2016 ; Vol. 8. pp. 16-20.
@article{294f6ff1b42f4e30b5cbce7eb9117065,
title = "Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching",
abstract = "Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.",
keywords = "CVD diamond coating, High etching rate, Hollow-cathode oxygen plasma, Micro-grooving, Plasma etching",
author = "Yunata, {Ersyzario Edo} and Tatsuhiko Aizawa",
year = "2016",
month = "4",
day = "1",
doi = "10.1016/j.mfglet.2016.05.001",
language = "English",
volume = "8",
pages = "16--20",
journal = "Manufacturing Letters",
issn = "2213-8463",
publisher = "Society of Manufacturing Engineers",

}

TY - JOUR

T1 - Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

AU - Yunata, Ersyzario Edo

AU - Aizawa, Tatsuhiko

PY - 2016/4/1

Y1 - 2016/4/1

N2 - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

AB - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

KW - CVD diamond coating

KW - High etching rate

KW - Hollow-cathode oxygen plasma

KW - Micro-grooving

KW - Plasma etching

UR - http://www.scopus.com/inward/record.url?scp=84968764463&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84968764463&partnerID=8YFLogxK

U2 - 10.1016/j.mfglet.2016.05.001

DO - 10.1016/j.mfglet.2016.05.001

M3 - Article

AN - SCOPUS:84968764463

VL - 8

SP - 16

EP - 20

JO - Manufacturing Letters

JF - Manufacturing Letters

SN - 2213-8463

ER -