Micro-Nano Lithography by MeV Ion Beam Writing

Katsuyoshi Takano, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Takeru Ohkubo, Masaki Sugimoto, Masashi Koka, Hiroyuki Nishikawa, Syu Seki

Research output: Contribution to journalArticle

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Micro-Nano Lithography by MeV Ion Beam Writing. / Takano, Katsuyoshi; Satoh, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Ohkubo, Takeru; Sugimoto, Masaki; Koka, Masashi; Nishikawa, Hiroyuki; Seki, Syu.

In: Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009), 01.09.2009.

Research output: Contribution to journalArticle

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author = "Katsuyoshi Takano and Takahiro Satoh and Yasuyuki Ishii and Tomihiro Kamiya and Takeru Ohkubo and Masaki Sugimoto and Masashi Koka and Hiroyuki Nishikawa and Syu Seki",
year = "2009",
month = "9",
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journal = "Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)",

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T1 - Micro-Nano Lithography by MeV Ion Beam Writing

AU - Takano, Katsuyoshi

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Ohkubo, Takeru

AU - Sugimoto, Masaki

AU - Koka, Masashi

AU - Nishikawa, Hiroyuki

AU - Seki, Syu

PY - 2009/9/1

Y1 - 2009/9/1

M3 - Article

JO - Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)

JF - Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)

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