Micro-pattering of siloxane films by proton beam writing

Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Micropatterning of two types of siloxane films, HSQ and SOG was studied by 1.0 MeV focused proton beam. FT-IR measurements show the transformation of the Si-O-Si structures in siloxane to networked structures after proton beam writing. Both the HSQ and SOG are negative resist for 1.0 MeV proton beam. Lines with smooth sidewalls were written by proton beam writing for both HSQ and SOG. Vertical sidewall is observed for HSQ, while it is tapered for SOG.

Original languageEnglish
Pages (from-to)239-243
Number of pages5
JournalJournal of Photopolymer Science and Technology
Volume22
Issue number2
DOIs
Publication statusPublished - 2009

Fingerprint

Siloxanes
Proton beams

Keywords

  • HSQ
  • Proton beam writing
  • Siloxane
  • SOG

ASJC Scopus subject areas

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

Cite this

Micro-pattering of siloxane films by proton beam writing. / Nishikawa, Hiroyuki; Tsuchiya, Ryutaro; Yasukawa, Tetsuro; Kaneko, Tomoki; Furuta, Yusuke; Ohishi, Tomoji.

In: Journal of Photopolymer Science and Technology, Vol. 22, No. 2, 2009, p. 239-243.

Research output: Contribution to journalArticle

Nishikawa, Hiroyuki ; Tsuchiya, Ryutaro ; Yasukawa, Tetsuro ; Kaneko, Tomoki ; Furuta, Yusuke ; Ohishi, Tomoji. / Micro-pattering of siloxane films by proton beam writing. In: Journal of Photopolymer Science and Technology. 2009 ; Vol. 22, No. 2. pp. 239-243.
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