Micro-patterning of Siloxane Films by Proton Beam Writing

Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)239-243
JournalJournal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)
Volume22
Publication statusPublished - 2009 Jun 1

Cite this

Micro-patterning of Siloxane Films by Proton Beam Writing. / Nishikawa, Hiroyuki; Tsuchiya, Ryutaro; Yasukawa, Tetsuro; Kaneko, Tomoki; Furuta, Yusuke; Ohishi, Tomoji.

In: Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009), Vol. 22, 01.06.2009, p. 239-243.

Research output: Contribution to journalArticle

Nishikawa, Hiroyuki ; Tsuchiya, Ryutaro ; Yasukawa, Tetsuro ; Kaneko, Tomoki ; Furuta, Yusuke ; Ohishi, Tomoji. / Micro-patterning of Siloxane Films by Proton Beam Writing. In: Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009). 2009 ; Vol. 22. pp. 239-243.
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