Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition

Shinji Muraishi, Tatsuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Ti thin films with and without nitrogen implantation was prepared by cold-sputtering for advanced processing of nano-structured materials. Ti films were grown on (001) Si substrates by ion-beam sputter deposition. Ti target of 99.9% purity was sputtered at room temperature by Ar+ with the beam energy of 1keV and the pressure of 5×10-2 Pa. Target and substrate were well-cooled in order to reduce the grain growth by increase of temperature. N+ implantation was carried out for 150 nm thick Ti films with the ion-energy of 100keV and the dose of 0.6∼5 × 10 17 ion/cm2. Cross-sectional TEM observation for as-deposited Ti film revealed that columnar grains in the order of 10 nm grew with the direction perpendicular to the Si substrate. Diffraction pattern from Ti film showed the Debye-ring consistent to fee structure, not the conventional hcp structure. After N+ implantation, strong [111] texture with the direction parallel to [001]Si was confirmed from diffraction pattern. Formation of nitride was confirmed by annealing the higher-dose samples. Tetragonal structure of Ti2N was detected among the tranceformed titanium phase with hcp structure. Formation of nitrides was discussed from the depth profile of nitrogen and chemical shift of Ti 2p spectrum through XPS analysis.

Original languageEnglish
Title of host publicationCeramic Transactions
EditorsM.R. De Guire, M.Z. Hu, Y. Gogotsi, S.W. Lu
Pages155-162
Number of pages8
Volume148
Publication statusPublished - 2004
Externally publishedYes
EventCeramic Nanomaterials and Nanotechnology II, Proceedings - Nashville, TN
Duration: 2003 Apr 272003 Apr 30

Publication series

NameCeramic Transactions
Volume148

Other

OtherCeramic Nanomaterials and Nanotechnology II, Proceedings
CityNashville, TN
Period03/4/2703/4/30

Fingerprint

Ion beams
Sputtering
Nitrides
Thin films
Diffraction patterns
Microstructure
Substrates
Nitrogen
Ions
Sputter deposition
Chemical shift
Titanium
Grain growth
Thick films
Nanostructured materials
X ray photoelectron spectroscopy
Textures
Annealing
Transmission electron microscopy
Temperature

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

Muraishi, S., & Aizawa, T. (2004). Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition. In M. R. De Guire, M. Z. Hu, Y. Gogotsi, & S. W. Lu (Eds.), Ceramic Transactions (Vol. 148, pp. 155-162). (Ceramic Transactions; Vol. 148).

Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition. / Muraishi, Shinji; Aizawa, Tatsuhiko.

Ceramic Transactions. ed. / M.R. De Guire; M.Z. Hu; Y. Gogotsi; S.W. Lu. Vol. 148 2004. p. 155-162 (Ceramic Transactions; Vol. 148).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Muraishi, S & Aizawa, T 2004, Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition. in MR De Guire, MZ Hu, Y Gogotsi & SW Lu (eds), Ceramic Transactions. vol. 148, Ceramic Transactions, vol. 148, pp. 155-162, Ceramic Nanomaterials and Nanotechnology II, Proceedings, Nashville, TN, 03/4/27.
Muraishi S, Aizawa T. Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition. In De Guire MR, Hu MZ, Gogotsi Y, Lu SW, editors, Ceramic Transactions. Vol. 148. 2004. p. 155-162. (Ceramic Transactions).
Muraishi, Shinji ; Aizawa, Tatsuhiko. / Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition. Ceramic Transactions. editor / M.R. De Guire ; M.Z. Hu ; Y. Gogotsi ; S.W. Lu. Vol. 148 2004. pp. 155-162 (Ceramic Transactions).
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