Micro-structuring of PVDF-TrFE by proton beam writing for tactile sensors

Yoshitaka Nojiri, Hidetaka Hayashi, Yasuyuki Ishii, Hiroyuki Nishikawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Aiming at micro-structuring of Polyvinylidene fluoride trifluoroethylene (PVDF-TrFE) film for sensing applications, we studied effects of proton beam irradiation and subsequent alkaline etching processes using potassium hydroxide (KOH) solution. Dependence of the pattering depth and linewidth on the beam energy, fluence, and etching time was investigated. The depth of pattering is mainly determined by etching time for PBW with beam energy of a few MeV and with fluence of less than 10 µC/mm2. By using a moderate fluence of 3.0 µC/mm2 and etching time of 3 h with beam energy of 1.7 MeV, we obtained 4 x 4 arrays of 40 µm height pillars with aspect ratio of about 5.

Original languageEnglish
Title of host publicationProceedings of 2020 International Symposium on Electrical Insulating Materials, ISEIM 2020
PublisherInstitute of Electrical Engineers of Japan
Pages447-450
Number of pages4
ISBN (Electronic)9784886864185
Publication statusPublished - 2020 Sep 13
Event2020 International Symposium on Electrical Insulating Materials, ISEIM 2020 - Virtual, Tokyo, Japan
Duration: 2020 Sep 132020 Sep 17

Publication series

NameProceedings of the International Symposium on Electrical Insulating Materials
Volume2020-September

Conference

Conference2020 International Symposium on Electrical Insulating Materials, ISEIM 2020
Country/TerritoryJapan
CityVirtual, Tokyo
Period20/9/1320/9/17

Keywords

  • PBW
  • PVDF-TrFE
  • Three-dimensional structures

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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