Microbeam complex at TIARA: Technologies to meet a wide range of applications

T. Kamiya, K. Takano, T. Satoh, Y. Ishii, H. Nishikawa, S. Seki, M. Sugimoto, S. Okumura, M. Fukuda

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed.

Original languageEnglish
Pages (from-to)2184-2188
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume269
Issue number20
DOIs
Publication statusPublished - 2011 Oct 15

Keywords

  • Accelerator
  • Ion microbeam
  • Micro-PIXE
  • PBW
  • Single ion hit
  • TIARA

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Fingerprint Dive into the research topics of 'Microbeam complex at TIARA: Technologies to meet a wide range of applications'. Together they form a unique fingerprint.

  • Cite this