TY - JOUR
T1 - Microbeam complex at TIARA
T2 - Technologies to meet a wide range of applications
AU - Kamiya, T.
AU - Takano, K.
AU - Satoh, T.
AU - Ishii, Y.
AU - Nishikawa, H.
AU - Seki, S.
AU - Sugimoto, M.
AU - Okumura, S.
AU - Fukuda, M.
N1 - Funding Information:
This work has been partly supported by Grants-in-Aid for Scientific Research and by the Quantum Beam Technology Program of the Ministry of Education, Culture, Sports, Science and Technology , Japan.
PY - 2011/10/15
Y1 - 2011/10/15
N2 - Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed.
AB - Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed.
KW - Accelerator
KW - Ion microbeam
KW - Micro-PIXE
KW - PBW
KW - Single ion hit
KW - TIARA
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U2 - 10.1016/j.nimb.2011.02.043
DO - 10.1016/j.nimb.2011.02.043
M3 - Article
AN - SCOPUS:80053576560
SN - 0168-583X
VL - 269
SP - 2184
EP - 2188
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 20
ER -