Micropatterning of polydiacetylene nanoparticle monolayer based on ultraviolet or electron beam polymerization

Daisuke Tanaka, Hisashi Karube, Masayuki Shimojo, Kotaro Kajikawa

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.

Original languageEnglish
Article number121604
JournalApplied Physics Express
Volume4
Issue number12
DOIs
Publication statusPublished - 2011 Dec

Fingerprint

Electron beams
Monolayers
polymerization
Polymerization
electron beams
Nanoparticles
nanoparticles
Irradiation
irradiation
Electron scattering
defocusing
light beams
Ultraviolet radiation
Masks
mesh
electron scattering
masks
grids
Copper
Heating

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Micropatterning of polydiacetylene nanoparticle monolayer based on ultraviolet or electron beam polymerization. / Tanaka, Daisuke; Karube, Hisashi; Shimojo, Masayuki; Kajikawa, Kotaro.

In: Applied Physics Express, Vol. 4, No. 12, 121604, 12.2011.

Research output: Contribution to journalArticle

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