Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry

Suraj Gopalakrishnan, Kenta Ono, Mikihiro Nomura, Takashi Sugawara, Hiromitsu Takaba, Shin-ichi Nakao

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)3263-3266
JournalTransactions of the Materials Research Society of Japan
Volume29
Publication statusPublished - 2004 Nov 1

Cite this

Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry. / Gopalakrishnan, Suraj; Ono, Kenta; Nomura, Mikihiro; Sugawara, Takashi; Takaba, Hiromitsu; Nakao, Shin-ichi.

In: Transactions of the Materials Research Society of Japan, Vol. 29, 01.11.2004, p. 3263-3266.

Research output: Contribution to journalArticle

Gopalakrishnan, Suraj ; Ono, Kenta ; Nomura, Mikihiro ; Sugawara, Takashi ; Takaba, Hiromitsu ; Nakao, Shin-ichi. / Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry. In: Transactions of the Materials Research Society of Japan. 2004 ; Vol. 29. pp. 3263-3266.
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