| Original language | English |
|---|---|
| Pages (from-to) | 3263-3266 |
| Journal | Transactions of the Materials Research Society of Japan |
| Volume | 29 |
| Publication status | Published - 2004 Nov 1 |
Cite this
Gopalakrishnan, S., Ono, K., Nomura, M., Sugawara, T., Takaba, H., & Nakao, S. (2004). Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry. Transactions of the Materials Research Society of Japan, 29, 3263-3266.
Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry. / Gopalakrishnan, Suraj; Ono, Kenta; Nomura, Mikihiro; Sugawara, Takashi; Takaba, Hiromitsu; Nakao, Shin-ichi.
In: Transactions of the Materials Research Society of Japan, Vol. 29, 01.11.2004, p. 3263-3266.Research output: Contribution to journal › Article
Gopalakrishnan, S, Ono, K, Nomura, M, Sugawara, T, Takaba, H & Nakao, S 2004, 'Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry', Transactions of the Materials Research Society of Japan, vol. 29, pp. 3263-3266.
Gopalakrishnan S, Ono K, Nomura M, Sugawara T, Takaba H, Nakao S. Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry. Transactions of the Materials Research Society of Japan. 2004 Nov 1;29:3263-3266.
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