Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Katsuyoshi Takano; Atsushi Asano; Yuta Maeyoshi; Hiromi Marui; Masaaki Omichi; Akinori Saeki; Shu Seki; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Masashi Koka; Takeru Ohkubo; Masaki Sugimoto; Hiroyuki Nishikawa

doi:10.2494/photopolymer.25.43

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Katsuyoshi Takano, Atsushi Asano, Yuta Maeyoshi, Hiromi Marui, Masaaki Omichi, Akinori Saeki, Shu Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Masashi Koka, Takeru Ohkubo, Masaki Sugimoto, Hiroyuki Nishikawa

Research output: Contribution to journal › Article

2 Citations (Scopus)

Original language	English
Pages (from-to)	43-46
Number of pages	4
Journal	Journal of Photopolymer Science and Technology
Volume	25
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.25.43
Publication status	Published - 2012

Keywords

Photolithography
Proton beam writing
SU-8 photoresist
Supercritical drying
Three dimensional structure

ASJC Scopus subject areas

Materials Chemistry
Polymers and Plastics
Organic Chemistry

Cite this

Takano, K., Asano, A., Maeyoshi, Y., Marui, H., Omichi, M., Saeki, A., ... Nishikawa, H. (2012). Microprocessing of arched bridge structures with epoxy resin by proton beam writing. Journal of Photopolymer Science and Technology, 25(1), 43-46. https://doi.org/10.2494/photopolymer.25.43

Microprocessing of arched bridge structures with epoxy resin by proton beam writing. / Takano, Katsuyoshi; Asano, Atsushi; Maeyoshi, Yuta; Marui, Hiromi; Omichi, Masaaki; Saeki, Akinori; Seki, Shu; Satoh, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Koka, Masashi; Ohkubo, Takeru; Sugimoto, Masaki; Nishikawa, Hiroyuki.

In: Journal of Photopolymer Science and Technology, Vol. 25, No. 1, 2012, p. 43-46.

Research output: Contribution to journal › Article

Takano, Katsuyoshi ; Asano, Atsushi ; Maeyoshi, Yuta ; Marui, Hiromi ; Omichi, Masaaki ; Saeki, Akinori ; Seki, Shu ; Satoh, Takahiro ; Ishii, Yasuyuki ; Kamiya, Tomihiro ; Koka, Masashi ; Ohkubo, Takeru ; Sugimoto, Masaki ; Nishikawa, Hiroyuki. / Microprocessing of arched bridge structures with epoxy resin by proton beam writing. In: Journal of Photopolymer Science and Technology. 2012 ; Vol. 25, No. 1. pp. 43-46.

@article{c76e4df8d56a40be99e61db42e61fcdd,

title = "Microprocessing of arched bridge structures with epoxy resin by proton beam writing",

keywords = "Photolithography, Proton beam writing, SU-8 photoresist, Supercritical drying, Three dimensional structure",

author = "Katsuyoshi Takano and Atsushi Asano and Yuta Maeyoshi and Hiromi Marui and Masaaki Omichi and Akinori Saeki and Shu Seki and Takahiro Satoh and Yasuyuki Ishii and Tomihiro Kamiya and Masashi Koka and Takeru Ohkubo and Masaki Sugimoto and Hiroyuki Nishikawa",

year = "2012",

doi = "10.2494/photopolymer.25.43",

language = "English",

volume = "25",

pages = "43--46",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "1",

}

TY - JOUR

T1 - Microprocessing of arched bridge structures with epoxy resin by proton beam writing

AU - Takano, Katsuyoshi

AU - Asano, Atsushi

AU - Maeyoshi, Yuta

AU - Marui, Hiromi

AU - Omichi, Masaaki

AU - Saeki, Akinori

AU - Seki, Shu

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Koka, Masashi

AU - Ohkubo, Takeru

AU - Sugimoto, Masaki

AU - Nishikawa, Hiroyuki

PY - 2012

Y1 - 2012

KW - Photolithography

KW - Proton beam writing

KW - SU-8 photoresist

KW - Supercritical drying

KW - Three dimensional structure

UR - http://www.scopus.com/inward/record.url?scp=84864465968&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864465968&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.25.43

DO - 10.2494/photopolymer.25.43

M3 - Article

AN - SCOPUS:84864465968

VL - 25

SP - 43

EP - 46

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

SN - 0914-9244

IS - 1

ER -

Access to Document

10.2494/photopolymer.25.43